Icp-ms

  • Comparison and Selection of ICP-OES and ICP-MS technologies

    Comparison and Selection of ICP-OES and ICP-MS technologies

    In the field of analytical chemistry, inductively coupled plasma (ICP) technology is widely used in elemental analysis due to its characteristics such as high sensitivity, low detection limit and wide linear dynamic range. ICP-OES (Inductively Coupled Plasma Optical Emission Spectrometry) and ICP-MS (Inductively Coupled Plasma Mass Spectrometry) are two analytical instruments based on ICP technology, and they each have their own characteristics and advantages in elemental analysis.

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  • The 5 Most Common Questions About ICP-MS

    The 5 Most Common Questions About ICP-MS

    Inductively Coupled Plasma Mass Spectrometry (ICP-MS) is a powerful analytical technique used for detecting trace elements and isotopes in various samples. In this article, we address the five most frequently asked questions about ICP-MS, covering topics such as its working principle, applications, advantages over other techniques, and best practices for obtaining accurate results. Whether you're new to ICP-MS or looking to deepen your understanding, this guide provides clear and concise answers to help you navigate the complexities of this essential analytical tool.

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  • VPD-ICP-MS Semiconductor Wafer Metal Contamination Analysis

    VPD-ICP-MS Semiconductor Wafer Metal Contamination Analysis

    The article primarily compares the differences in detection limits between VPD-ICP-MS and TXRF technologies for VPD.

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