Fib

This paper primarily introduces the basic principles and developmental history of FIB technology.

The FIB-SEM system integrates ion beam and electron microscopy functions, allowing for microscopic imaging and analysis in multiple scientific disciplines. This article provides a detailed introduction to the principles and main application areas of FIB-SEM.

The high efficiency sputtering of FIB enables fine processing of samples, so FIB is often used to optimise the preparation of ultra-thin samples for TEM.

Focused Ion Beam (FIB) technology enables precise micro- and nanostructuring of materials, though it faces challenges like defects and uneven etching, which can be mitigated through various optimization techniques.

Focused Ion Beam (FIB) technology is similar to a miniature, high-precision "sculpting tool" for materials, and is widely used in areas such as the fabrication of microscopic electronic devices.

This article introduces the advanced chip cross-section sampling methods, as well as the comparison of three different sampling methods, including metallographic sectioning, ion milling, and focused ion beam FIB cutting.