Xps

This paper focuses on the process of XRD physical phase analysis.

During XPS testing, staff at the Scientific Compass Testing Platform found that many students, while familiar with XPS through literature or senior recommendations, are still beginners in understanding its principles. To help, the UNIVERSALLAB team compiled online resources to assist the research community.

This article provides a detailed explanation of the detection principle of X-ray photoelectron spectroscopy (XPS), highlighting its high sensitivity to sample surfaces and semi-quantitative nature. It also points out the differences between SEM-EDS and EDS, as well as how to address surface contamination and choose the appropriate analysis methods.

X-ray photoelectron spectroscopy (XPS) analyzes elements (except H and He) by measuring photoelectron binding energy, providing detailed information on surface composition, chemical states, and bonding. This non-destructive, highly sensitive technique, with a surface analysis depth of ~2 nm, is widely used for qualitative and quantitative analysis, oxidation state identification, and surface studies in catalysis, corrosion, and thin films. XPS spectra include main lines for elemental identification, spin-orbit splitting, Auger peaks, and energy loss features, making it essential for material science and surface chemistry research.

This article mainly introduces the principles and characteristics of XPS, as well as its qualitative and quantitative analysis, depth profiling, and angle-resolved X-ray photoelectron spectroscopy.

The article mainly introduces the common problems encountered during XPS data analysis.

Understanding X-ray Photoelectron Spectroscopy (XPS) in This Article

This article focuses on X-ray photoelectron spectroscopy (XPS) so that the reader can understand it